| Liquid immersion deep-ultraviolet interferometric lithography JA Hoffnagle, WD Hinsberg, M Sanchez, FA Houle Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 687 | 1999 |
| Particle suspension reactors and materials for solar-driven water splitting DM Fabian, S Hu, N Singh, FA Houle, T Hisatomi, K Domen, FE Osterloh, ... Energy & Environmental Science 8 (10), 2825-2850, 2015 | 412 | 2015 |
| Photoelectron spectroscopy of methyl, ethyl, isopropyl, and tert-butyl radicals. Implications for the thermochemistry and structures of the radicals and their corresponding … FA Houle, JL Beauchamp Journal of the American Chemical Society 101 (15), 4067-4074, 1979 | 290 | 1979 |
| Pathways to electrochemical solar-hydrogen technologies S Ardo, DF Rivas, MA Modestino, VS Greiving, FF Abdi, EA Llado, ... Energy & environmental science 11 (10), 2768-2783, 2018 | 284 | 2018 |
| Mechanistic insights into chemical and photochemical transformations of bismuth vanadate photoanodes FM Toma, JK Cooper, V Kunzelmann, MT McDowell, J Yu, DM Larson, ... Nature communications 7 (1), 12012, 2016 | 274 | 2016 |
| Life-cycle net energy assessment of large-scale hydrogen production via photoelectrochemical water splitting R Sathre, CD Scown, WR Morrow, JC Stevens, ID Sharp, JW Ager, ... Energy & Environmental Science 7 (10), 3264-3278, 2014 | 236 | 2014 |
| Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance W Hinsberg, FA Houle, J Hoffnagle, M Sanchez, G Wallraff, M Morrison, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 219 | 1998 |
| Detection and investigation of allyl and benzyl radicals by photoelectron spectroscopy FA Houle, JL Beauchamp Journal of the American Chemical Society 100 (11), 3290-3294, 1978 | 183 | 1978 |
| The technical and energetic challenges of separating (photo) electrochemical carbon dioxide reduction products JB Greenblatt, DJ Miller, JW Ager, FA Houle, ID Sharp Joule 2 (3), 381-420, 2018 | 174 | 2018 |
| Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists WD Hinsberg, FA Houle, MI Sanchez, GM Wallraff IBM Journal of Research and Development 45 (5), 667-682, 2001 | 174 | 2001 |
| Gaseous products from the reaction of XeF2 with silicon HF Winters, FA Houle Journal of Applied Physics 54 (3), 1218-1223, 1983 | 174 | 1983 |
| Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist FA Houle, WD Hinsberg, M Morrison, MI Sanchez, G Wallraff, C Larson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 158 | 2000 |
| Laser chemical vapor deposition of copper FA Houle, CR Jones, T Baum, C Pico, CA Kovac Applied Physics Letters 46 (2), 204-206, 1985 | 139 | 1985 |
| Basic mechanisms in laser etching and deposition FA Houle Applied Physics A 41, 315-330, 1986 | 128 | 1986 |
| Selective deposition of copper TH Baum, FA Houle, CR Jones, CA Kovac US Patent 4,574,095, 1986 | 119 | 1986 |
| Thermal and acid‐catalyzed deprotection kinetics in candidate deep ultraviolet resist materials G Wallraff, J Hutchinson, W Hinsberg, F Houle, P Seidel, R Johnson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 111 | 1994 |
| Photoeffects on the fluorination of silicon. I. Influence of doping on steady‐state phenomena FA Houle The Journal of chemical physics 79 (9), 4237-4246, 1983 | 109 | 1983 |
| Photochemical generation and deposition of copper from a gas phase precursor CR Jones, FA Houle, CA Kovac, TH Baum Applied physics letters 46 (1), 97-99, 1985 | 103 | 1985 |
| The effect of vibration and translational energy on the reaction dynamics of the H+2 +H2 system SL Anderson, FA Houle, D Gerlich, YT Lee The Journal of chemical physics 75 (5), 2153-2162, 1981 | 103 | 1981 |
| Opportunities to improve the net energy performance of photoelectrochemical water-splitting technology R Sathre, JB Greenblatt, K Walczak, ID Sharp, JC Stevens, JW Ager, ... Energy & Environmental Science 9 (3), 803-819, 2016 | 102 | 2016 |
Ian D. SharpWalter Schottky Institut and Physik Department, Technische Universität MünchenVerified email at wsi.tum.de
