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Robert Stahlbush
Robert Stahlbush
Verified email at nrl.navy.mil
Title
Cited by
Cited by
Year
Post‐irradiation cracking of H2 and formation of interface states in irradiated metal‐oxide‐semiconductor field‐effect transistors
RE Stahlbush, AH Edwards, DL Griscom, BJ Mrstik
Journal of applied physics 73 (2), 658-667, 1993
2141993
Bias‐dependent etching of silicon in aqueous KOH
OJ Glembocki, RE Stahlbush, M Tomkiewicz
Journal of the Electrochemical Society 132 (1), 145, 1985
1891985
Post-irradiation behavior of the interface state density and the trapped positive charge
RE Stahlbush, BJ Mrstik, RK Lawrence
IEEE Transactions on Nuclear Science 37 (6), 1641-1649, 1990
1241990
Interface states induced by the presence of trapped holes near the silicon–silicon‐dioxide interface
DJ DiMaria, DA Buchanan, JH Stathis, RE Stahlbush
Journal of applied physics 77 (5), 2032-2040, 1995
1171995
Electron and hole trapping in irradiated SIMOX, ZMR and BESOI buried oxides
RE Stahlbush, GJ Campisi, JB McKitterick, WP Maszara, P Roitman, ...
IEEE transactions on nuclear science 39 (6), 2086-2097, 1992
1091992
Basal plane dislocation reduction in 4H-SiC epitaxy by growth interruptions
RE Stahlbush, BL VanMil, RL Myers-Ward, KK Lew, DK Gaskill, CR Eddy
Applied Physics Letters 94 (4), 2009
1062009
X‐ray rocking curve measurement of composition and strain in Si‐Ge buffer layers grown on Si substrates
M Fatemi, RE Stahlbush
Applied physics letters 58 (8), 825-827, 1991
971991
On the driving force for recombination-induced stacking fault motion in 4H–SiC
JD Caldwell, RE Stahlbush, MG Ancona, OJ Glembocki, KD Hobart
Journal of Applied Physics 108 (4), 2010
962010
Stacking-fault formation and propagation in 4H-SiC PiN diodes
RE Stahlbush, M Fatemi, JB Fedison, SD Arthur, LB Rowland, S Wang
Journal of electronic materials 31, 370-375, 2002
932002
Use of atomic layer epitaxy buffer for the growth of InSb on GaAs by molecular beam epitaxy
PE Thompson, JL Davis, J Waterman, RJ Wagner, D Gammon, DK Gaskill, ...
Journal of applied physics 69 (10), 7166-7172, 1991
861991
Glide and multiplication of basal plane dislocations during 4H‐SiC homoepitaxy
X Zhang, M Skowronski, KX Liu, RE Stahlbush, JJ Sumakeris, MJ Paisley, ...
Journal of Applied Physics 102 (9), 2007
822007
Turning of basal plane dislocations during epitaxial growth on 4 off-axis 4H-SiC
RL Myers-Ward, BL VanMil, RE Stahlbush, SL Katz, JM McCrate, SA Kitt, ...
Materials Science Forum 615, 105-108, 2009
782009
Structure of stacking faults formed during the forward bias of diodes
ME Twigg, RE Stahlbush, M Fatemi, SD Arthur, JB Fedison, JB Tucker, ...
Applied physics letters 82 (15), 2410-2412, 2003
742003
Whole-wafer mapping of dislocations in 4H-SiC epitaxy
RE Stahlbush, KX Liu, Q Zhang, JJ Sumakeris
Materials science forum 556, 295-298, 2007
682007
Observation of stacking faults from basal plane dislocations in highly doped 4H-SiC epilayers
NA Mahadik, RE Stahlbush, MG Ancona, EA Imhoff, KD Hobart, ...
Applied Physics Letters 100 (4), 2012
672012
Effect of oxidation and reoxidation on the oxide-substrate interface of 4H-and 6H-SiC
GG Jernigan, RE Stahlbush, NS Saks
Applied Physics Letters 77 (10), 1437-1439, 2000
662000
Recombination-induced stacking fault degradation of 4H-SiC merged-PiN-Schottky diodes
JD Caldwell, RE Stahlbush, EA Imhoff, KD Hobart, MJ Tadjer, Q Zhang, ...
Journal of Applied Physics 106 (4), 2009
652009
Anomalous positive charge formation by atomic hydrogen exposure
RE Stahlbush, E Cartier, DA Buchanan
Microelectronic Engineering 28 (1-4), 15-18, 1995
621995
Interfacial differences between SiO2 grown on 6H-SiC and on Si (100)
GG Jernigan, RE Stahlbush, MK Das, JA Cooper, LA Lipkin
Applied physics letters 74 (10), 1448-1450, 1999
581999
Basal plane dislocation reduction for 8 off-cut, 4H-SiC using in situ variable temperature growth interruptions
BL VanMil, RE Stahlbush, RL Myers-Ward, KK Lew, CR Eddy, DK Gaskill
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
562008
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