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Hyun Yong Cho
Hyun Yong Cho
Pinotbio, Inc.
Verified email at pinotbio.com
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Year
Current Status of Combinatorial and High‐Throughput Methods for Discovering New Materials and Catalysts
SI Woo, KW Kim, HY Cho, KS Oh, MK Jeon, NH Tarte, TS Kim, ...
QSAR & Combinatorial Science 24 (1), 138-154, 2005
572005
Efficient route for cyclic olefin polymerization: nonchelated monodentate benzimidazole nickel (II) complex catalysts for vinyl polymerization of norbornene
NH Tarte, HY Cho, SI Woo
Macromolecules 40 (23), 8162-8167, 2007
372007
High‐Throughput Synthesis of New Ni(II), Pd(II), and Co(II) Catalysts and Polymerization of Norbornene Utilizing the Self‐Made Parallel Polymerization Reactor …
HY Cho, DS Hong, DW Jeong, YD Gong, SI Woo
Macromolecular rapid communications 25 (1), 302-306, 2004
272004
The effect of water and acidity of the clay for ethylene polymerization over Cp2ZrCl2 supported on TMA-modified clay materials
DW Jeong, DS Hong, HY Cho, SI Woo
Journal of Molecular Catalysis A: Chemical 206 (1-2), 205-211, 2003
252003
Polyethylene‐Montmorillonite Nanocomposites: Preparation, Characterization and Properties
L Cui, HY Cho, JW Shin, NH Tarte, SI Woo
Macromolecular symposia 260 (1), 49-57, 2007
222007
Positive photosensitive resin composition
J Doo-Young, J Jeong, CHO Hyun-Yong, YOO Yong-Sik, M Chung, ...
US Patent 8,198,002, 2012
132012
Polymerization of Methyl Acrylate by a 2, 6‐Bis (2‐benzimidazyl) pyridine Zirconium Dichloride/MAO Catalyst System
HY Cho, NH Tarte, L Cui, DS Hong, SI Woo, YD Gong
Macromolecular Chemistry and Physics 207 (21), 1965-1971, 2006
112006
Poisoning effect of CO on ethylene polymerization with Ni (II)–diimine/MAO
DS Hong, DW Jeong, HY Cho, L Cui, NH Tarte, SI Woo
Polymer 47 (1), 184-192, 2006
92006
Positive type photosensitive resin composition
JW Lee, YOO Yong-Sik, CHO Hyun-Yong, J Jeong, J Doo-Young, JH Lee, ...
US Patent 9,176,381, 2015
72015
Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
J Jeong, JY Lee, JH Lee, CHO Hyun-Yong, S Kim, Y Eun-Kyung, JH Lee, ...
US Patent 8,815,489, 2014
72014
Olefin homopolymerization catalyzed over asymmetric and symmetric ni (II) diimine complexes
TS Seo, DS Hong, DW Jung, HY Cho, SI Woo
Korean Journal of Chemical Engineering 19, 622-626, 2002
72002
Positive photosensitive resin composition, and photosensitive resin layer and display device using the same
K Ji-Yun, JH Kang, KIM Dae-Yun, KIM Sang-Kyeon, S Kim, S Kim, ...
US Patent 8,921,019, 2014
52014
Positive photosensitive resin composition
J Jeong, M Chung, CHO Hyun-Yong, J Doo-Young, JH Lee, ...
US Patent 8,420,287, 2013
52013
Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
JH Lee, CHO Hyun-Yong, IM Mi-Ra, HS Cheon, M Chung, J Jeong, ...
US Patent 9,023,559, 2015
42015
Positive photosensitive resin composition
CHO Hyun-Yong, J Doo-Young, YOO Yong-Sik, J Jeong, JH Lee, ...
US Patent 8,703,367, 2014
42014
Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
CHA Myoung-Hwan, JH Lee, IM Mi-Ra, M Chung, J Jeong, ...
US Patent 8,841,064, 2014
32014
Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same
M Chung, J Jeong, CHO Hyun-Yong, YOO Yong-Sik, JW Lee, JH Lee, ...
US Patent 8,592,131, 2013
32013
Syntheses and reactivities of new bis (imido) Mo (VI) complexes of hydrotris (3, 5-dimethyl-1-pyrazolyl) borate and X-ray molecular structures of [{HB (3, 5-Me2C3N2H) 3} Mo …
HY Cho, SG Roh, JH Jeong
Polyhedron 21 (12-13), 1211-1215, 2002
32002
Photosensitive resin composition and color filter using the same
K Ji-Yun, YJ Ryu, HAN Gyu-Seok, HS Cheon, CHO Hyun-Yong
US Patent 9,487,694, 2016
12016
Positive photosensitive resin composition
K Ji-Yun, JH Lee, CHO Hyun-Yong, KIM Dae-Yun, KIM Sang-Kyeon, ...
US Patent 9,256,118, 2016
12016
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