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Subhadeep Kal
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A novel dry selective etch of SiGe for the enablement of high performance logic stacked gate-all-around nanosheet devices
N Loubet, S Kal, C Alix, S Pancharatnam, H Zhou, C Durfee, M Belyansky, ...
2019 IEEE International Electron Devices Meeting (IEDM), 11.4. 1-11.4. 4, 2019
772019
Electrocatalytic Proton Reduction by a Dicobalt Tetrakis-Schiff Base Macrocycle in Nonaqueous Electrolyte
S Kal, AS Filatov, PH Dinolfo
Inorganic chemistry 53 (14), 7137, 2014
622014
Semiconductor apparatus having stacked gates and method of manufacture thereof
J Smith, AJ Devilliers, KN Tapily, S Kal, GJ Leusink
US Patent 10,833,078, 2020
602020
Stress and resistivity analysis of electrodeposited gold films for MEMS application
S Kal, A Bagolini, B Margesin, M Zen
Microelectronics journal 37 (11), 1329-1334, 2006
432006
Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications
A Raley, S Thibaut, N Mohanty, S Kal, S Nakamura, A Ko, D O'Meara, ...
SPIE Advanced Lithography, 97820F-97820F-14, 2016
352016
Method for incorporating multiple channel materials in a complimentary field effective transistor (CFET) device
J Smith, S Kal
US Patent 10,685,887, 2020
332020
Selective deposition with surface treatment
KH Yu, KN Tapily, T Hakamata, S Kal, GJ Leusink
US Patent 10,378,105, 2019
332019
Three-dimensional semiconductor device and method of fabrication
J Smith, A Devilliers, N Mohanty, S Kal, K Tapily
US Patent 9,997,598, 2018
322018
High-pressure modifications of CaZn2, SrZn2, SrAl2, and BaAl2: Implications for Laves phase structural trends
S Kal, E Stoyanov, JP Belieres, TL Groy, R Norrestam, U Häussermann
Journal of Solid State Chemistry 181 (11), 3016-3023, 2008
272008
Method for controlling transistor delay of nanowire or nanosheet transistor devices
J Smith, S Kal, A Devilliers
US Patent 10,714,391, 2020
232020
Structural, Electrochemical, and Spectroscopic Investigation of Acetate Bridged Dinuclear Tetrakis-Schiff Base Macrocycles of Mn and Zn
S Kal, AS Filatov, PH Dinolfo
Inorganic chemistry 52 (24), 13963–13973, 2013
232013
Evidence for Catalytic Water Oxidation by a Dimanganese Tetrakis-Schiff Base Macrocycle
S Kal, L Ayensu-Mensah, PH Dinolfo
Inorganica Chimica Acta 423, 201–206, 2014
222014
Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic …
M Korde, S Kal, C Alix, N Keller, GA Antonelli, A Mosden, AC Diebold
Journal of Vacuum Science & Technology B 38 (2), 2020
212020
EPE improvement thru self-alignment via multi-color material integration
N Mohanty, JT Smith, L Huli, C Pereira, A Raley, S Kal, C Fonseca, X Sun, ...
Optical Microlithography XXX 10147, 13-25, 2017
142017
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
A Dutta, J Church, J Lee, B O’Brien, L Meli, CC Liu, S Sharma, K Petrillo, ...
Extreme Ultraviolet (EUV) Lithography XI 11323, 213-224, 2020
122020
Method and system for selective spacer etch for multi-patterning schemes
S Kal, AD Raley, N Mohanty, A Mosden
US Patent 9,748,110, 2017
122017
Isotropic silicon and silicon-germanium etching with tunable selectivity
S Kal, KN Tapily, A Mosden
US Patent 9,984,890, 2018
112018
Reverse contact and silicide process for three-dimensional logic devices
J Smith, H Niimi, J Grzeskowiak, D Chanemougame, L Liebmann, ...
US Patent 11,264,274, 2022
102022
Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks
S Kal, N Mohanty, AD Raley, A Mosden, SW LeFevre
US Patent 10,971,372, 2021
102021
Reverse contact and silicide process for three-dimensional semiconductor devices
J Smith, L Liebmann, D Chanemougame, H Niimi, K Tapily, S Kal, ...
US Patent 11,322,401, 2022
92022
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