V. Narayanan
V. Narayanan
IBM T. J. Watson Research Center
Verified email at us.ibm.com - Homepage
Title
Cited by
Cited by
Year
Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges
EP Gusev, V Narayanan, MM Frank
IBM Journal of Research and Development 50 (4.5), 387-410, 2006
3512006
A comparative study of NBTI and PBTI (charge trapping) in SiO2/HfO2 stacks with FUSI, TiN, Re gates
S Zafar, Y Kim, V Narayanan, C Cabral, V Paruchuri, B Doris, J Stathis, ...
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers., 23-25, 2006
2452006
Oxygen vacancies in high dielectric constant oxide-semiconductor films
S Guha, V Narayanan
Physical review letters 98 (19), 196101, 2007
2062007
Switching of ferroelectric polarization in epitaxial BaTiO 3 films on silicon without a conducting bottom electrode
C Dubourdieu, J Bruley, TM Arruda, A Posadas, J Jordan-Sweet, ...
Nature nanotechnology 8 (10), 748-754, 2013
2032013
Comparative study of GaN and AlN nucleation layers and their role in growth of GaN on sapphire by metalorganic chemical vapor deposition
K Lorenz, M Gonsalves, W Kim, V Narayanan, S Mahajan
Applied Physics Letters 77 (21), 3391-3393, 2000
1202000
High-/Metal-Gate Fully Depleted SOI CMOS With Single-Silicide Schottky Source/Drain With Sub-30-nm Gate Length
MH Khater, Z Zhang, J Cai, C Lavoie, C D'Emic, Q Yang, B Yang, ...
IEEE Electron Device Letters 31 (4), 275-277, 2010
1172010
Examination of flatband and threshold voltage tuning of field effect transistors by dielectric cap layers
S Guha, VK Paruchuri, M Copel, V Narayanan, YY Wang, PE Batson, ...
Applied Physics Letters 90 (9), 092902, 2007
1162007
A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first process
X Chen, S Samavedam, V Narayanan, K Stein, C Hobbs, C Baiocco, W Li, ...
2008 Symposium on VLSI Technology, 88-89, 2008
1132008
Origins of threading dislocations in GaN epitaxial layers grown on sapphire by metalorganic chemical vapor deposition
V Narayanan, K Lorenz, W Kim, S Mahajan
Applied Physics Letters 78 (11), 1544-1546, 2001
1112001
A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
S Krishnan, U Kwon, N Moumen, MW Stoker, ECT Harley, S Bedell, ...
2011 International Electron Devices Meeting, 28.1. 1-28.1. 4, 2011
1092011
High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing
M Chudzik, B Doris, R Mo, J Sleight, E Cartier, C Dewan, D Park, H Bu, ...
2007 IEEE Symposium on VLSI Technology, 194-195, 2007
1082007
Fundamental aspects of HfO2-based high-k metal gate stack reliability and implications on tinv-scaling
E Cartier, A Kerber, T Ando, MM Frank, K Choi, S Krishnan, B Linder, ...
2011 International Electron Devices Meeting, 18.4. 1-18.4. 4, 2011
1062011
Role of oxygen vacancies in V/sub FB//V/sub t/stability of pFET metals on HfO/sub 2
E Cartier, FR McFeely, V Narayanan, P Jamison, BP Linder, M Copel, ...
Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005., 230-231, 2005
1012005
Band-edge high-performance high-k/metal gate n-MOSFETs using cap layers containing group IIA and IIIB elements with gate-first processing for 45 nm and beyond
TC Chen, G Shahidi, S Guha, M Ieong, MP Chudzik, R Jammy, ...
2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers., 178-179, 2006
962006
Epitaxial silicon and germanium on buried insulator heterostructures and devices
NA Bojarczuk, M Copel, S Guha, V Narayanan, EJ Preisler, FM Ross, ...
Applied physics letters 83 (26), 5443-5445, 2003
932003
Fundamental understanding and optimization of PBTI in nFETs with SiO2/HfO2 gate stack
E Cartier, BP Linder, V Narayanan, VK Paruchuri
2006 International Electron Devices Meeting, 1-4, 2006
912006
Understanding mobility mechanisms in extremely scaled HfO2 (EOT 0.42 nm) using remote interfacial layer scavenging technique and Vt-tuning dipoles with gate …
T Ando, MM Frank, K Choi, C Choi, J Bruley, M Hopstaken, M Copel, ...
2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009
892009
High-k/metal gate innovations enabling continued CMOS scaling
MM Frank
2011 Proceedings of the European Solid-State Device Research Conference …, 2011
802011
High-κ/Metal Gate Science and Technology
S Guha, V Narayanan
Annual Review of Materials Research 39, 181-202, 2009
762009
Physical origins of mobility degradation in extremely scaled gate stacks with La and Al induced dipoles
T Ando, M Copel, J Bruley, MM Frank, H Watanabe, V Narayanan
Applied Physics Letters 96 (13), 132904, 2010
732010
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