Optical absorption enhancement in silicon nanowire arrays with a large lattice constant for photovoltaic applications C Lin, ML Povinelli Optics express 17 (22), 19371-19381, 2009 | 483 | 2009 |
Broadband absorption of semiconductor nanowire arrays for photovoltaic applications N Huang, C Lin, ML Povinelli Journal of Optics 14 (2), 024004, 2012 | 119 | 2012 |
Optimal design of aperiodic, vertical silicon nanowire structures for photovoltaics C Lin, ML Povinelli Optics express 19 (105), A1148-A1154, 2011 | 114 | 2011 |
Toward Optimized Light Utilization in Nanowire Arrays Using Scalable Nanosphere Lithography and Selected Area Growth AR Madaria, M Yao, CY Chi, N Huang, C Lin, R Li, ML Povinelli, ... Nano letters 12 (6), 2839-2845, 2012 | 111 | 2012 |
Imbalance aware lithography hotspot detection: a deep learning approach H Yang, L Luo, J Su, C Lin, B Yu Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (3), 033504, 2017 | 99 | 2017 |
Limiting efficiencies of tandem solar cells consisting of III-V nanowire arrays on silicon N Huang, C Lin, ML Povinelli Journal of Applied Physics 112 (6), 064321, 2012 | 84 | 2012 |
Effect of aperiodicity on the broadband reflection of silicon nanorod structures for photovoltaics C Lin, N Huang, ML Povinelli Optics express 20 (101), A125-A132, 2012 | 56 | 2012 |
Experimental broadband absorption enhancement in silicon nanohole structures with optimized complex unit cells C Lin, LJ Martínez, ML Povinelli Optics Express 21 (105), A872-A882, 2013 | 53 | 2013 |
The effect of plasmonic particles on solar absorption in vertically aligned silicon nanowire arrays C Lin, ML Povinelli Applied Physics Letters 97 (7), 071110, 2010 | 42 | 2010 |
Machine learning assisted SRAF placement for full chip S Wang, J Su, Q Zhang, W Fong, D Sun, S Baron, C Zhang, C Lin, ... SPIE Photomask Technology, 10451 (104510D), 7, 2017 | 16 | 2017 |
Fabrication of transferrable, fully suspended silicon photonic crystal nanomembranes exhibiting vivid structural color and high-Q guided resonance C Lin, LJ Martinez, ML Povinelli Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013 | 15 | 2013 |
Optical absorption enhancement in silicon nanowire and nanohole arrays for photovoltaic application C Lin, ML Povinelli CLEO/QELS: 2010 Laser Science to Photonic Applications, 1-2, 2010 | 14 | 2010 |
Design and optical characterization of high-Q guided-resonance modes in the slot-graphite photonic crystal lattice LJ Martínez, N Huang, J Ma, C Lin, E Jaquay, ML Povinelli Optics Express 21 (25), 30975-30983, 2013 | 12 | 2013 |
EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes R Gronheid, C Boeckx, J Doise, J Bekaert, I Karageorgos, J Ruckaert, ... SPIE Advanced Lithography 9776, 97761W, 2016 | 10 | 2016 |
Effect of guided resonance modes on emission from GaN core–shell nanorod arrays PD Anderson, C Lin, ML Povinelli Applied Physics A 117 (4), 1879-1884, 2014 | 9 | 2014 |
Assist feature placement based on machine learning J Su, Y Zou, C Lin, Y Cao, YW Lu, C Been-Der, Q Zhang, SHL BARON, ... US Patent App. 16/606,791, 2020 | 6 | 2020 |
Feasibility study of grapho-epitaxy DSA for complementing EUV lithography beyond N10 C Lin, Y Zou, I Karageorgos, J Ryckaert, P Raghavan, R Gronheid, ... International Symposium on DSA 2015, 2015 | 5 | 2015 |
Detailed balance limit of silicon nanowire and nanohole array solar cells C Lin, ML Povinelli SPIE Solar Energy+ Technology, 81110U-81110U-6, 2011 | 5 | 2011 |
Process context based wafer level grouping control: an advanced overlay process correction designed for DRAM 1z nm node in high volume manufacturing L Zhang, W Susanto, K Takahashi, A Chen, T Tang, Y Zou, C Lin, ... Metrology, Inspection, and Process Control for Microlithography XXXIV 11325 …, 2020 | 4 | 2020 |
A novel patterning control strategy based on real-time fingerprint recognition and adaptive wafer level scanner optimization HE Cekli, J Nije, A Ypma, V Bastani, D Sonntag, H Niesing, L Zhang, ... SPIE Advanced Lithography 10585, 105851N, 2018 | 4 | 2018 |