The electrical asymmetry effect in capacitively coupled radio-frequency discharges U Czarnetzki, J Schulze, E Schüngel, Z Donkó Plasma Sources Science and Technology 20 (2), 024010, 2011 | 243* | 2011 |
Possibilities of determining non-Maxwellian EEDFs from the OES line-ratios in low-pressure capacitive and inductive plasmas containing argon and krypton XM Zhu, YK Pu, Y Celik, S Siepa, E Schüngel, D Luggenhölscher, ... Plasma Sources Science and Technology 21 (2), 024003, 2012 | 198* | 2012 |
FAST TRACK COMMUNICATION: The electrical asymmetry effect in capacitively coupled radio frequency discharges-measurements of dc self bias, ion energy and ion flux J Schulze, E Schüngel, U Czarnetzki Journal of Physics D Applied Physics 42 (9), 2009 | 190* | 2009 |
The electrical asymmetry effect in capacitively coupled radio frequency discharges–measurements of dc self bias, ion energy and ion flux J Schulze, E Schüngel, U Czarnetzki Journal of Physics D: Applied Physics 42 (9), 092005, 2009 | 190 | 2009 |
Phase resolved optical emission spectroscopy: a non-intrusive diagnostic to study electron dynamics in capacitive radio frequency discharges J Schulze, E Schüngel, Z Donkó, D Luggenhölscher, U Czarnetzki Journal of Physics D: Applied Physics 43 (12), 124016, 2010 | 140 | 2010 |
Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas A Derzsi, I Korolov, E Schüngel, Z Donkó, J Schulze Plasma Sources Science and Technology 24 (3), 034002, 2015 | 127* | 2015 |
The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges J Schulze, E Schüngel, Z Donkó, U Czarnetzki Plasma Sources Science and Technology 20 (1), 015017, 2011 | 127 | 2011 |
Secondary electrons in dual-frequency capacitive radio frequency discharges J Schulze, Z Donkó, E Schüngel, U Czarnetzki Plasma Sources Science and Technology 20 (4), 045007, 2011 | 117 | 2011 |
Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments Z Donkó, J Schulze, U Czarnetzki, A Derzsi, P Hartmann, I Korolov, ... Plasma Physics and Controlled Fusion 54 (12), 124003, 2012 | 115 | 2012 |
The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges Z Donkó, J Schulze, P Hartmann, I Korolov, U Czarnetzki, E Schüngel Applied Physics Letters 97 (8), 081501, 2010 | 107 | 2010 |
The effect of the driving frequency on the confinement of beam electrons and plasma density in low-pressure capacitive discharges S Wilczek, J Trieschmann, J Schulze, E Schuengel, RP Brinkmann, ... Plasma Sources Science and Technology 24 (2), 024002, 2015 | 97 | 2015 |
Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model J Schulze, E Schüngel, U Czarnetzki, Z Donkó Journal of Applied Physics 106 (6), 063307, 2009 | 95 | 2009 |
Kinetic interpretation of resonance phenomena in low pressure capacitively coupled radio frequency plasmas S Wilczek, J Trieschmann, D Eremin, RP Brinkmann, J Schulze, ... Physics of Plasmas 23 (6), 063514, 2016 | 80 | 2016 |
Experimental observation and computational analysis of striations in electronegative capacitively coupled radio-frequency plasmas YX Liu, E Schüngel, I Korolov, Z Donkó, YN Wang, J Schulze Physical review letters 116 (25), 255002, 2016 | 76 | 2016 |
The effect of ambipolar electric fields on the electron heating in capacitive RF plasmas J Schulze, Z Donko, A Derzsi, I Korolov, E Schuengel Plasma Sources Science and Technology 24 (1), 015019, 2014 | 74 | 2014 |
Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4 S Brandt, B Berger, E Schüngel, I Korolov, A Derzsi, B Bruneau, ... Plasma Sources Science and Technology 25 (4), 045015, 2016 | 67 | 2016 |
Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect E Schüngel, QZ Zhang, S Iwashita, J Schulze, LJ Hou, YN Wang, ... Journal of Physics D: Applied Physics 44 (28), 285205, 2011 | 65 | 2011 |
Coupling effects in inductive discharges with radio frequency substrate biasing J Schulze, E Schüngel, U Czarnetzki Applied Physics Letters 100 (2), 024102, 2012 | 60 | 2012 |
Effect of structured electrodes on heating and plasma uniformity in capacitive discharges N Schmidt, J Schulze, E Schüngel, U Czarnetzki Journal of Physics D: Applied Physics 46 (50), 505202, 2013 | 59 | 2013 |
The electrical asymmetry effect in geometrically asymmetric capacitive radio frequency plasmas E Schüngel, D Eremin, J Schulze, T Mussenbrock, U Czarnetzki Journal of Applied Physics 112 (5), 053302, 2012 | 59 | 2012 |