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Richard Gottscho
Richard Gottscho
Lam Research
Verified email at alum.mit.edu
Title
Cited by
Cited by
Year
Microscopic uniformity in plasma etching
RA Gottscho, CW Jurgensen, DJ Vitkavage
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1992
8311992
Overview of atomic layer etching in the semiconductor industry
KJ Kanarik, T Lill, EA Hudson, S Sriraman, S Tan, J Marks, V Vahedi, ...
Journal of Vacuum Science & Technology A 33 (2), 2015
6042015
Systems, methods and apparatus for choked flow element extraction
A Shajii, R Gottscho, S Benzerrouk, A Cowe, SP Nagarkatti, WR Entley
US Patent 9,449,793, 2016
5072016
Semiconductor processing system having multiple decoupled plasma sources
JP Holland, PLG Ventzek, H Singh, R Gottscho
US Patent 8,900,402, 2014
4652014
The gaseous electronics conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing …
PJ Hargis Jr, KE Greenberg, PA Miller, JB Gerardo, JR Torczynski, ...
Review of Scientific Instruments 65 (1), 140-154, 1994
4651994
Switched uniformity control
RA Gottscho, RJ Steger
US Patent 7,282,454, 2007
3222007
Vacuum-integrated hardmask processes and apparatus
J Marks, GA Antonelli, RA Gottscho, DM Hausmann, A Lavoie, TJ Knisley, ...
US Patent 9,778,561, 2017
3052017
Negative ion kinetics in RF glow discharges
RA Gottscho, CE Gaebe
IEEE transactions on plasma science 14 (2), 92-102, 1986
2621986
Optical techniques in plasma diagnostics
RA Gottscho, TA Miller
Pure and Applied Chemistry 56 (2), 189-208, 1984
2381984
Glow-discharge sheath electric fields: Negative-ion, power, and frequency effects
RA Gottscho
Physical Review A 36 (5), 2233, 1987
2111987
Sensitive, Nonintrusive, In-Situ Measurement of Temporally and Spatially Resolved Plasma Electric Fields
CA Moore, GP Davis, RA Gottscho
Physical review letters 52 (7), 538, 1984
2071984
The grand challenges of plasma etching: a manufacturing perspective
CGN Lee, KJ Kanarik, RA Gottscho
Journal of Physics D: Applied Physics 47 (27), 273001, 2014
1992014
Optical emission actinometry and spectral line shapes in rf glow discharges
RA Gottscho, VM Donnelly
Journal of applied physics 56 (2), 245-250, 1984
1971984
Design of high-density plasma sources for materials processing
MA Lieberman, RA Gottscho
Physics of Thin Films 18, 1-119, 1994
1821994
Atomic layer etching: rethinking the art of etch
KJ Kanarik, S Tan, RA Gottscho
The journal of physical chemistry letters 9 (16), 4814-4821, 2018
1702018
Integrated liquid crystal display and digitizer having a black matrix layer adapted for sensing screen touch location
RA Boie, RA Gottscho, AR Kmetz, RH Krukar, PY Lu, JR Morris Jr
US Patent 5,847,690, 1998
1671998
Measurement of spatially resolved gas‐phase plasma temperatures by optical emission and laser‐induced fluorescence spectroscopy
GP Davis, RA Gottscho
Journal of Applied Physics 54 (6), 3080-3086, 1983
1591983
Ion transport in an electron cyclotron resonance plasma
N Sadeghi, T Nakano, DJ Trevor, RA Gottscho
Journal of applied physics 70 (5), 2552-2569, 1991
1541991
Ion dynamics of rf plasmas and plasma sheaths: A time‐resolved spectroscopic study
RA Gottscho, RH Burton, DL Flamm, VM Donnelly, GP Davis
Journal of applied physics 55 (7), 2707-2714, 1984
1241984
Ion and neutral temperatures in electron cyclotron resonance plasma reactors
T Nakano, N Sadeghi, RA Gottscho
Applied physics letters 58 (5), 458-460, 1991
1191991
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